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2005 Annual
Symposium Papers
CMP Users Group
- Proceedings
June, 2002
Copper and Low-k: Consumables Outlook
Dr. John Davis, Kline
Development of Copper Slurries for Advanced Technologies
Jeff Chamberlain, Cabot Microelectronics
Nitrogen-Based Slurry Development for Copper/Low-k (SiLK
TM
) Integration
Lily Yao, EKC Technology, Inc.
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