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NCCAVS Marketing Opportunities

(138k pdf)

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Morgan Technical Ceramics

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ICPT 2015
Sept 30 - Oct 2, 2015

Chandler (Phoenix), AZ
www.icpt2015cmp.org
Abstract Deadline:
April 16, 2015

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CMP Users Group - Announcements

CMP Users Group (Northern California Chapter of the American Vacuum Society, in collaboration with the College of Nanoscale Science and Engineering, SUNY Polytechnic Institute and SEMATECH invite you to join the spring 2015 meeting of the CMPUG at Albany.

Topic: Advances in CMP Consumables, Materials and Tools

FREE REGISTRATION/ADMISSION (Need to register for security approval)
**Free registration link on the Event Website.**

Platinum Sponsors: Air Products, Applied Materials, Fujifilm-Planar Solutions, Nexplanar

Gold Sponsors: Axus Technologies, Dow, Entegris, Entrepix, Morgan Advanced Materials

Silver Sponsors: 3M, BASF, Fujimi Corporation, Hitachi Chemical, Levitronix, Malema

Meeting Date: April 16, 2015
Time: 1:00 - 5:30 pm
(Registration/Badge Pick-Up begins at 12.30pm)

Location:

Nanofab South Auditorium
Colleges of Nanoscale Science & Engineering (CNSE)
SUNY Polytechnic Institute
255 Fuller Road, Albany, NY 12203
(*Web Meeting Instructions, see below for instructions)
Parking: Follow the event parking sign (to be posted by the security prior to the event). Parking is free.

Co-Chair(s): Gautam Banerjee, banerjg@airproducts.com
Michael Pevny, mpevny@mmm.com

The symposium will provide an international forum for academic researchers, industrial practitioners and engineers from around the world for the exchange of information on state-of-the-art research in CMP semiconductor technology. The CMPUG promotes the exchange of opportunities, ideas, friendly relationships and research collaboration.

Agenda

12:30pm - Registration/Badge Pick up at Nano Fab South rotunda

1:00pm - Welcome and Acknowledgment of Sponsors;
- G. Banerjee, Symposium Chair, Air Products

1:05pm - Welcome from AVS Student Chapter @ CNSE and Hudson Mohawk Chapter of AVS;
- C. Ventrice, Associate Prof of CNSE

1:10pm - Introductory remarks on CMP Center and Welcome to Campus;
- F. Tolic, Associate VP of Business, CNSE-SUNY Polytechnic Institute/ S. Paparao, Director of Process Technology, SEMATECH

1:25pm - J. Nalaskowski/T. Burroughs - SEMATECH/CNSE - "FEOL CMP Process and Consumables Characterization Vehicle for 14nm Node and Beyond"

1:50pm - H. J. Kim - Global Foundries - "Process optimization in post W CMP in-situ cleaning"

2:15pm - A.S. Vahdat - “Effect of kinematics and abrasive particle dynamics on material removal rate uniformity during polishing”

2:40 - S. Brenner - CNSE - "Occupational Exposure to Nanomaterials: Assessing the Potential for Cutaneous Exposure to Metal Oxide Nanoparticles in a Semiconductor Facility"

3:05 - Coffee Break/Poster Session/Networking

3:40 - M. Corbett - Linx Consulting - "CMP Cost Issues & Impact on Consumables for Memory and Logic"

4:05 - D. Dickmann - Ferro Corporation - "Advances in Ceria Slurries to Address Challenges in Fabricating Next Generation Devices"

4:30 - H. Takeda - Fujimi Corporation - "Development of a High Si3N4 Selective Slurry"

4:55 - H. A. Kwong - SEMATECH - "Out-gassing from III-V Wafer Processing"

5:20 - ICPT announcements

5:25 - Concluding remarks; M. Pevny, Symposium co-Chair, 3M

5:30 - Adjourn/optional tour of NFX viewing area

All student participants are encouraged to submit poster abstracts through April 10, 2015.

All presentations will be posted on the CMPUG Proceedings webpage and will be live via Webcast (see instructions below).

If you would like to sponsor this meeting or list a banner ad on the User Group website, please contact Michael Pevny, CMPUG Sponsor Chair at: mpevny@mmm.com or check out our "NCCAVS Marketing/Sponsorship" opportunities at: http://www.avsusergroups.org/misc_pdfs/NCCAVS_marketing_opportunities.pdf

WEB MEETING INSTRUCTIONS
Line is reserved from 1:00 pm – 6:30pm
Windstream telecom/web meeting line #2
Audio Number: 800 501 8979
Access Code: 4595674
Website: https://conf.cfer.com/

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