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2005 Annual
Symposium Papers
Junction Technology Group
- Proceedings
July, 2002
Comparison of Indium Metrology using LEXES and SIMS
Dimitry Kouzminov, Accurel
Plasma Doping as a Tool for the Fabrication of Advanced Semiconductor Devices
Susan Felch, Varian Semiconductor Equipment
Recent Advances in Implant Metrology with the Shallow Probe/LEXES Tool from Cameca
Pierre Straub, Cameca
Spike RTP for Ultra-Shallow Junction Formation
Paul Timans, Mattson
Update on Implant Dopant Materials
Jim Mayer, ATMI Inc.
Web-based Ion Implantation Course
Michael Current, SemiZone
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