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2005 Annual
Symposium Papers
Junction Technology Group
- Proceedings
2004
April
Junction Scaling Technology for the sub-90 nm Node and Beyond
Jack Hwang, Intel
Precision Alignment of the GSD End Station
John Schuur, Innovion
Ultra-Shallow Junction Formation Techniques to Satisfy Advanced Device Requirements
Susan Felch, Applied Materials
Ultra-Shallow Junctions with PLAD
Jinning Liu, Varian Semiconductor Equipment Associates
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