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Junction Technology Group - Announcements

SEMICON WEST 2016 MEETING
Topic: New Processes and Tools for Implantation, Annealing and Metrologies

YOU MUST REGISTER FOR SEMICON WEST TO ATTEND THE JTG MEETING

Use the following link for Complimentary registration for NCCAVS User Group Members: https://www.xpressreg.net/register/SEMI0716/landing.asp?sc=GOSEMIN&aban=&hkey=&iq=&vip=&tm=&EmailID

Meeting Date: Thursday, July 14, 2016
Time: 12:00 p.m. – 4:00 p.m.

**FREE REGISTRATION AND PARKING**

Location: SEMICON West
Moscone South, West Mezzanine, Room 256

Co-Chairs: Michael Current, currentsci@aol.com
John Borland, johnoborland@aol.com Intevac

SPONSORS:

Axcelis, KLA-Tencor, Nissin Ion Equipment, Ultratech, Intevac, Applied Materials

AGENDA
12:00-12:30pm Tom Karpowicz CAPRES
Micro Four Point Probing for advanced Nodes

12:30-1:00pm Babak Adibi Intevac
Efficacy & Cost Advantages are Driving Ion Implant Adoption in Commercial PV Cell Fabrication

1:00-1:30pm Fareen Adeni Khaja Applied Materials
Contact Resistance Reduction using Advanced Implant and Anneal Techniques for 7 nm Node and Beyond

1:30-2:00pm Nobuhiro Tokoro Nissin Ion
Medium Current Ion Implanter 3000AH-8C

2:00-2:30pm Ice Cream and Conversation Break

2:30-3:00pm Dick James ChipWorks
Moore's Law into the 1x-nm Era

3:00-3:30pm Jim McWhirter Ultratech
LXA: Nanosecond Laser Anneal for sub-10nm

3:30-4:00pm John Borland JOB Technologies
Highlights of IWJT16, VLSI16 & IIT16

All presentations will be requested to be posted on the JTG Proceedings webpage.

If you would like to sponsor the JTG July Meeting at SEMICON West, please contact Michael Current, currentsci@aol.com

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