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Plasma Applications Group - Proceedings

August 2009
Topic: Instrumentation and Metrology for Plasma Processing

Introduction (173k pdf)
- Paul Werbaneth and Didier Florin

Application notes for OERS technology (1.3MB pdf)
-Stephen Daniels, Lexas; Presented by Didier Florin, EmbeddedMetrology.com

Guidelines for selecting an appropriate detector (813k pdf)
- Mario Kasahara, Hamamatsu

Chemical and Remote Plasma Clean Impedance Endpoint Detection (904k pdf)
- Terry Turner, Fourth Rite

Electrical Non-contact Characterization of Plasma Processing Induced Damage on Blanket Oxides and Patterned Low-k Dielectrics (3.4MB pdf)
- Laurent Kitzinger, Andrew Findlay, John D'Amico, Nikos Jaeger, Vladimir Talanov, Semilab

Mid Infrared Absorption Spectroscopy System for Plasma Monitoring (2MB pdf)
- Juergen Roepke, Neoplas Control; Presented by Randall Wilcox, Lightspeed Technologies

A remote plasma sensor that produces atomic level spectra can open a brand new frontier for the application of optical emission spectroscopy data (952k pdf)
- Chuck Borowski and Joe Monkowski, Pivotal Systems

© Copyright 2009 American Vacuum Society