UV Photons and Synergistic Roughening Mechanisms of 193 nm Photoresist in Inductively Coupled Plasmas (6.112MB pdf)
- Monica J. Titus, David B. Graves, UC Berkeley, Dept. of Chemical Engineering, mjtitus.berkeley@gmail.com
Selective Influence of Magnetic Field Direction on Plasma Uniformity
- Vladimir Kudriavtsev, Wenli Collison, Intevac; Michael Barnes, Mark Kushner, University of Michigan, vkudriavtsev at intevac.com
ICP-RIE of Ultrananocrystalline Diamond (3.612MB pdf)
- Nicolaie Moldovan, Hongjun Zeng, John A. Carlisle, Advanced Diamond Technologies, Inc.; Ralu Divan, Argonne National Laboratory, moldovan@thindiamond.com
Scaling Laws and Peculiarities of Micro and Macro Plasmas (1.970MB pdf)
- Vladimir Kolobov, CFDRC, vik@cfdrc.com
Uniform Growth of Large Area a-Si / mc-Si Tandem Junction Thin Film Solar Cells By Capacitive Coupled PECVD (2.471MB pdf)
- Yi Zheng, Applied Materials, yi_zheng@amat.com