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Plasma Applications Group - Proceedings

July 2010
Topic: Advances in Plasma Technology

Observations on the business and market aspects of Tier 2 ($10M-$100M annual revenue) capital equipment companies working on plasma applications in the 300mm and sub-300mm space in the fields of LED, MEMS, and packaging, (3.9MB pdf)
-Robert Castellano, The Information Network

Plasma Activation - An Enabling Technology for Wafer Bonding, (1.5MB pdf)
-Eric F. Pabo, Viorel Dragoi, Thorsten Matthias, and Paul Lindner, EVGroup

Examining cost of ownership of crystalline-silicon solar-cell processing: texturization and cleaning, (4.9MB pdf)
-David Jimenez, Wright Williams & Kelly, Inc., Ismail Kashkoush, Ph.D., Akrion Systems

Trends in Plasma Etching and Deposition for LED Fabrication, (3.5MB pdf)
-David Lishan, Ph.D., Plasma-Therm LLC

Monolayer Etching using soft plasma sources, (584k pdf)
-Ed Korczynski, BetaSights

Plasma diagnostics using harmonics analysis in processing plasmas, (631k)
-ChinWook Chung, Department of Electrical and Computer Engineering, HanYang University

Design specific variation in via/contact pattern transfer-Full chip analysis, (5.9MB pdf)
-Valeriy Sukharev, Jun-Ho Choy, Ara Markosian, Armen Kteyan and Yuri Granik, Mentor Graphics Corp.; Vladimir Bliznetsov, Institute of Microelectronics, 117685 Singapore

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