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Plasma Applications Group - Proceedings

May 2011
Topic: New Plasma Technology

High Power Impulse Magnetron Sputtering: A journey from early research to advanced processing (11.4MB pdf)
- André Anders (aanders@lbl.gov), Lawrence Berkeley National Laboratory, University of California, Berkeley

Atmospheric pressure gas plasmas for biomedical applications
- Yukinori Sakiyama and David Graves, University of California, Berkeley
(2.7MB pdf)

Pulsed Plasmas for Advanced Dry Etching Processes
- Ankur Agarwal (ankur_agarwal@amat.com), Applied Materials, Inc.
(NA)

Improving the Quality of Barrier/Seed Interface by Optimizing Physical Vapor Deposition of Cu Film in Hollow Cathode Magnetron
- A. Dulkin, E. Ko, L. Wu, I. Karim, K.Leeser, K.J. Park, Novellus Systems, Inc., L. Meng, D.N. Ruzic, University of Illinois at Urbana-Champaign
(3.4MB pdf)

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