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Plasma Applications Group - Proceedings

July 2011
Topic: Advanced Plasma Technology for Semiconductor, Thin Film, & Solar Processing

Capacitive and Inductive RF Plasma Sources for Industrial Applications (2.3MB)
- Valery Godyak, RF Plasma Consulting, Brookline, MA

Nano-fabrication for Patterned Magnetic Storage Media
(10.7MB)- Dan Kercher, Hitachi Global Storage Technologies, San Jose, CA

Towards Adaptive Kinetic-Fluid Simulations of Weekly Ionized Plasma (2MB)
- Vladimir I Kolobov, CFD Research Corp, Huntsville, AL

Pulsed Plasmas for Advanced Dry Etching Processes (NA)
- Ankur Agarwal,Samer Banna, Shahid Rauf, Torgsten Lill, Ken Collins, and Olivier Joubert, Applied Materials, Ankur_agarwal at amat.com

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© Copyright 2011 American Vacuum Society