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Plasma Applications Group - Announcements

FREE ADMISSION-No need to register, just show up!!
Topic: Plasma Processing for Novel Materials

Meeting Date: April 29, 2013
Start Time: 1:30 - 5:00 pm

Location:

SEMI Global Headquarters
Seminar rooms 1 & 2
3081 Zanker Road, San Jose, CA 95134
**Park in SEMI Global Parking Lots ONLY**

Chairs:

Kamatchi Subramanian, pksubramanian12@yahoo.com
Dan Flamm, Microtechnology Law & Analysis, dlf@mtag.com
mailto:Valeriy_Sukharev@mentor.com

Agenda:

1:30–1:35 Welcome and Introduction
Kamatchi Subramanian

1:35–1:50 Introduction to Plasmas and Chemistries for Etching Novel Materials
Daniel L. Flamm, Microtechnology Law & Analysis, Walnut Creek, CA

1:50–2:20 Plasma Application in Read head and Magnetic Sensor,
Dr. Zheng Gao, Hitachi Global Storage, San Jose, CA

2:20-2:50 Integration of Disruptive Materials for Advanced Non-Volatile Memories
Wilbur Catabay, Telefunken Semiconductor International, Technology
Development & Commercialization Services, San Jose, CA

2:50–3:05 Break and Networking

3:05-3:35 Plasma Etching of Niobium
Travis Oh, D-Wave Systems, Burnaby, British Columbia

3:35-4:05 Real - Time Determination of Compositional profiles in structured materials using Laser Ablation and LA-ICPMSA
Alexander A. Bol'shakov, Jong H. Yoo, Jhanis J. Gonzalez, Richard E. Russo,
Applied Spectra Inc., Fremont, CA 94538

4:05 -4:35 Plasma Etching of SiC
Dr.Necmi Bilir, Consultant, Materials Research and Development, Palo Alto, CA.

4:35-4:45 Discussion, Questions, and Networking


If you would like to sponsor a meeting or list a banner ad on the User Group website, please check out our "NCCAVS Marketing/Sponsorship" opportunities at: http://www.avsusergroups.org/misc_pdfs/2013_NCCAVS_marketing.pdf


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