August 2008
Topic: Plasma Etch Related Metrology and Diagnostics
Process Chemistry Analysis by Microplasma Optical Emission (1.3MB pdf)
- Chris Doughty, Verionix, Inc.
Rethinking Metrology with Metryx Mass Metrology (2.7MB pdf)
- Liam Cunnane, Metryx
Utilizing VM Combined with On-Tool and Off-Tool APC to Enhance Productivity and Reduce Waste at Etch
- Kyoung-Shik Jun, MAS GPM, AMAT
New Applications for Optical Emission Spectroscopy (OES) (2.5MB pdf)
- Gary Powell and Herb Litvak, Lightwind Corp., Petaluma, CA
Super High Performance Spectrograph (261K pdf)
- Frank Mendoza, Verity Instruments, Inc.
Innovating Measurement Technology (3.7MB pdf)
- Mark D. Hannaford,CyberOptics
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