Announcements
Proceedings
Committee
Schedule
About
Join
PE Users Group
- Proceedings
July, 2006
Control of Contact Hole Distortion by Using Polymer Deposition Process (PDP) for sub-65nm Technology and Beyond
Judy Wang, Applied Materials
Etch Processes for Nano-scale Vertical MOS Devices
Hoon Cho, Stanford University
Integrated CD Shrink Methodologies for Contact Etch
Kang-lie Chiang, Applied Materials
© Copyright 2008 American Vacuum Society
