Synthesis and Integration of Multifunctional Oxide Materials (1.3MB pdf)
- Jane P. Chang, Department of Chemical and Biomolecular Engineering, UCLA

Fundamental Issues and Integration Landscape for High-k Metal Gate (887k pdf)
- Steven Hung, Applied Materials

Growth and interfacial structure of epitaxial complex oxides on silicon (1.8MB pdf)
- James Reiner, Department of Applied Physics, Yale University

ALD High k and AVD® GST Thin Films Using Novel Vaporizer Technology For Microelectronics Applications (Not Available)
- Yoshi Senzaki, Carl Barelli, Yoshi Okuyama, H.Y. Kim, Gi Kim, Johannes Lindner, Brian Lu, Zia Karim, and Sasangan Ramanathan, AIXTRON, Inc., USA;
- Ulli Weber, Peer Lehnen, Peter Baumann, Sergej Pasko, Olaf Wurzinger, Bernhard Seitzinger, and Cecil Joulaud, AIXTRON AG, Germany