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December 2010
Topic: Advanced Device Integration - FEOL/BEOL
FDSOI Metal Gate Transistors for Ultra Low Power Subthreshold Operation (3.9MB pdf)
- Steven Vitale, J. Kedzierski, P. W. Wyatt, M. Renzi, and C. L. Keast, MIT Lincoln Laboratories
Developing a robust conditioning system in 300mm CuCMP (1.2MB pdf)
- John Zabasajja, Michael Pevny, Tammy Engfer and Doug Pysher, 3M Corp
Process Technology Explosion: New Frontiers at Intersections of Semiconductor and Related Technologies (2.4MB pdf)
- Brian Goodlin, Texas Instruments
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