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- Proceedings
December, 2002
Alternating Layer Deposition of Dielectric Films
A.P. Paranjpe, TORREX
Fundamental Vacuum Beam Studies of Radical Enhanced Atomic Layer Chemical Vapor Deposition (REALCVD)
Frank Greer, Ph. D., Novellus Systems, Inc.
The PE-ALD of Ta Based Metals/Nitrides: The Growth, Materials Properties, and Applications to Future Device Fabrications
Hyungjun Kim, IBM
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