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TF Users Group - Proceedings
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| 2003 |
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February
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Optical Metrology for SiGe process
Yong Ji, Jobin Yvon, Inc.
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April
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Analysis of high-k HfO2 and HfSiOx dielectric films
Wesley Nieveen, Scientific Fellow
Characterization of High-k Dielectrics with VUV Spectroscopic Ellipsometer and Grazing X-ray Reflectometer
P. Boher, SOPRA
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May
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An Overview of OLED Display Technology
Homer Antoniadis, OSRAM Opto Semiconductors Inc.
Fabrication and Characterization of High-Performance Polymer Thin-Film Transistors
Alberto Salleo, Palo Alto Research Center
Nanoscale Molecular-Switch Crossbar
Yong Chen, Quantum Science Research
Nanoscale Molecular-Switch Devices Fabricated by Imprint Lithography
Yong Chen, Quantum Science Reseach
Nanowires of Four Epitaxial Hexagonal Silicides Grown on Si(001)
Yong Chen, Quantum Science Research
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November
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A Study of Dilute Cu Alloys for Dual-Damascene Interconnect Applications
Eal Lee (email: Eal.Lee@Honeywell.com), Honeywell Electronic Materials
SE & GXR Reflectometry Analyses on Tungsten Carbide (WCx) Films For Diffusion Barrier in Copper Metallization Schemes
Adrien Darragon, SOPRA, Inc.
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December
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Chamber Conductance Modeling Using Transition Flow CFD and a Thermal Radiation Analogy to Free Molecular Flow
Lawrence A. Gochberg, Novellus Systems, Inc.
Gas-surface interaction modeling for carbon nanotube deposition
David Hash, NASA Ames Research Center
Integration of Modeling and Simulation into Process Development
Peter L.G. Ventzek, Motorola Inc.
Modeling for Metrology Tool Design and Performance
Gary Janik, KLA-Tencor
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