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October 2007
Advanced FEOL Integration:
Resistive switching for next generation Flash technology (1.5MB pdf)
- Christie Marrian, Spansion
Feature scale modeling of a gate etch process used to study SRAM bit cell pattern transfer into a gate stack (3.4MB pdf)
- Phillip Stout, Applied Materials
Advanced Patterning Thin Films (2.3MB pdf)
- Minh Tran, Spansion, Inc.
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