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TF Users Group - Proceedings

February, 2006

Development Low H Damascene SiN for Advanced FLASH Cu BEOL
  Alex Níkel, Advanced Process Development, Advanced Micro Devic

Pure-Silica-Zeolites as Low-k Materials
  Zijian Li, University of California, Riverside

The Case For High Aspect Ratio (HAR) Interconnects
  Uri Cohen, UC Consulting

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