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- Proceedings
April, 2006
Device and Technology Challenges for Nanoscale CMOS
H.-S. Philip Wong, Stanford University
Gate Stack Scaling, Challenges and Approaches in Meeting Technology Requirements
Yi Ma, Applied Materials
New Devices to Extend Scaling of Non-volatile Memory
Zoran Krivokapic, AMD
Pulse Nucleantion Layer (PNL) WN/W and Its Application on Direct Contact Fill
Juwen Gao, Novellus
Siconi Preclean for FEOL Applications
Xinliang Lu, Applied Materials
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