Announcements
Proceedings
Committee
Schedule
About
Join
TF Users Group
- Proceedings
April, 2006
Device and Technology Challenges for Nanoscale CMOS
H.-S. Philip Wong, Stanford University
Gate Stack Scaling, Challenges and Approaches in Meeting Technology Requirements
Yi Ma, Applied Materials
New Devices to Extend Scaling of Non-volatile Memory
Zoran Krivokapic, AMD
Pulse Nucleantion Layer (PNL) WN/W and Its Application on Direct Contact Fill
Juwen Gao, Novellus
Siconi Preclean for FEOL Applications
Xinliang Lu, Applied Materials
© Copyright 2008 American Vacuum Society
