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Semicon West 2008 - July 17, 2008
FREE ADMISSION—No need to register, just show up!!
Topic: USJ Formation for 32nm Node
Meeting Date: July 17, 2008
Time: 8:30 am – 6:00 pm
Agenda:
8:30-8:55AM: FREE REGISTRATION OPENS
8:55-9:00AM Welcome/Introduction
9:00-9:35AM: Synopsys: Ignacio Martin-Bragado, “Modeling of temperature, stress, defects and dopant activation in Si, SiGe and SiC during spike and msec annealing for 32nm node”
9:35-10:10AM: Spansion: Sue Felch, “32nm node shallow junction problems and solutions”
10:10-10:45AM: Mattson: Paul Timans, “fRTP update for 32nm node”
10:45-11:20AM: DNS: Hiroki Kiyama, “FLA update for 32nm node”
11:20-11:55AM: Ultratech: Jeff Hebb, “LSA update for 32nm node”
11:55-1:00PM LUNCH (provided)
1:00-1:35PM: Axcelis: Mark Harris, “Single wafer implantation process matching issues”
1:35-2:10PM: SemEquip: Wade Krull, “Cluster Implant for 32nm”
2:10-2:45PM: UJT: Bunji Mizuno, “Plasma doping”
2:45-3:05PM: BREAK
3:05-3:40PM: TEL-Epion: Nathan Baxter, “Infusion doping for 32nm node”
3:40-4:15PM: JOB Technologies: John Borland, “32nm node USJ formation using Rapid Process Optimization Metrology”
4:15-4:50PM: KLA-Tencor: Brian Chung, “TW metrology for implant and annealing at 32nm node”
Corporate Sponsorship Opportunities available at NCCAVS User Group Meetings!
For details please contact Heather Korff, NCCAVS Office, 530-896-0477, heather@avs.org.
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